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Nanotechnology

Nanofabrication / manufacturing

Tools and Instruments

Keyword

Organizational Unit

NanoFab Tool: 4Wave IBE-20B Ion Milling System

The 4Wave IBE-20B ion milling system uses a broad argon ion beam to controllably and uniformly remove material from a user's substrate. A secondary ion mass

NanoFab Tool: ABM Mask Contact Aligner

The ABM contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 800 nm. The tool offers vacuum

NanoFab Tool: ADT 7132 Dicing Saw

The ADT 7132 dicing saw is used to cut multi-device substrates into individual chips. The system can accommodate substrates up to 4 mm thick and supports sizes

NanoFab Tool: AllWin21 Downstream Asher

The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system

NanoFab Tool: AnnealSys RTA

The AnnealSys model AS-Master is a single wafer rapid thermal process system supports anneal processing in the NanoFab cleanroom. This tools supports anneals

Photograph of the ASML PAS5500/275D Stepper.

NanoFab Tool: ASML PAS5500/275D Stepper

The ASML PAS 5500/275D is a high throughput i-line stepper. It utilizes 5X reduction and projection capability with step and repeat to transfer photomask

NanoFab Tool: Atomic Layer Deposition

The Oxford FlexAL atomic layer deposition (ALD) system supports plasma and thermal ALD coating processes with precise ultrathin and pinhole free films. The

NanoFab Tool: Bruker Dektak XT Profilometer

The Bruker Dektak XT contact profilometer measures the thin film thickness of patterned features by sensing the deflection of a fine stylus that is raster

NanoFab Tool: CEE Apogee Spinner

The CEE Apogee is a resist spinner system. The tool is used to uniformly apply photoresist on substrates ranging from 200 mm diameter wafers down to small

NanoFab Tool: Envirco Laminar Hood

The Envirco 1.8 m laminar hood provides soft lithography lab users a clean environment to perform final assembly processes on PDMS samples. The hood is capable

NanoFab Tool: Filmetrics F40-UV Reflectometer

The Filmetrics F40-UV reflectometer provides users with rapid thin film thickness and optical constants measurements on most common device film stacks. The F40

Photograph of the Arradiance Gemstar atomic layer deposition system.

NanoFab Tool: Gemstar Atomic Layer Deposition

The Arradiance Gemstar atomic layer deposition (ALD) system supports thermal ALD coating processes with precise ultrathin and pinhole free films in a compact

NanoFab Tool: GnP 412S, Post-CMP Wafer Cleaner

This tool removes the particulate residues resulting after wafer polishing using the CMP. These particles are typically a few tens of nanometers in size. The

NanoFab Tool: Harrick Plasma PDC-32 Plasma Bonder

The Harrick Plasma PDC-32 plasma bonder is used to remove fine particles on user substrates prior to release agent treatment and to modify the surface bonds of

NanoFab Tool: Heidelberg MLA150 Maskless Aligner

The MLA150 has been specifically designed for direct-wafer writing and easy operation. It offers all the capabilities that are required for single layer and

Photograph of the Lattice Gear LatticeAx cleave tool.

NanoFab Tool: Lattice Gear LatticeAx Cleaving Tool

The Lattice Gear LatticeAx cleaving tool is used for highly accurate, manual cleaving of substrates. The system is an indenting and cleaving tool that produces

Photo Leica EM GP automatic plunge freezer

NanoFab Tool: Leica EM GP Automatic Plunge Freezer

The Leica EM GP automatic plunge freezer uses the bare grid technique to prepare vitrified fluid specimens for analysis in the transmission electron microscope

NanoFab Tool: Mercury Probe

The Four Dimensions CV92A mercury probe system provides non-destructive and rapid measurement of current-voltage and capacitance-voltage curves to derive

NanoFab Tool: Microwave Asher

The microwave plasma system is used for photoresist descum/removal and wafer cleaning. The system is equipped with a hand free door opening system for easy

NanoFab Tool: Nikon SMZ1500 Stereo Microscope

The Nikon SMZ1500 is a long working distance stereo microscope that supports both reflected light and transmitted light modes for inspecting substrates and

NanoFab Tool: Olympus SZH10 Stereo Microscope

The Olympus SZH10 is a long working distance stereo microscope that supports both reflected light and transmitted light modes for inspecting substrates and

NanoFab Tool: PDMS Casting Station

The CNST NanoFab PDMS casting station consists of a Hamilton Safeaire fume hood which houses a Smart Coater 100 spinner, a Dataplate digital hot plate, an Ohaus

Photograph of the Reynolds RCA wet bench

NanoFab Tool: RCA Wet Bench B102

The Reynolds RCA wet bench is used to remove organic and metal contamination from the surfaces of substrates prior to high temperature furnace processing. The

Photograph of the Unaxis 790 reactive ion etcher.

NanoFab Tool: Reactive Ion Etcher Unaxis 790 Right

The Unaxis 790 reactive ion etcher (RIE) is a general purpose parallel plate plasma etching system which uses ionized fluorocarbon gases and oxygen to etch

NanoFab Tool: Reactive Ion Etcher 790 Nitride Left

This PlasmaTherm 790 reactive ion etcher (RIE) is a parallel plate plasma etching system which uses fluorocarbon and oxygen gases to etch silicon nitride thin