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NanoFab Tool: AllWin21 Downstream Asher

AllWin21 Downstream plasma asher

The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system is capable of handling 100 mm (4 in) diameter substrates.

Specifications/Capabilities

  • Fixed 1000 W 2.4 GHz Radio frequency (RF) power source.
  • Unique process gases: oxygen (O2).
  • Downstream ashing of resist.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 100 mm (4 in).
  • Small pieces supported: yes 

Typical Applications

Isotropic descum or stripping of resists.

Created May 5, 2022