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https://www.nist.gov/pml
Physical Measurement Laboratory
PML is a world leader in the science of measurement. We determine the definitive methods for nearly every kind of measurement employed in commerce and research, provide NIST-traceable calibrations, and disseminate standards and best practices throughout the nation. At the same time, PML works continuously at the outermost frontiers of metrology, devising tools and techniques to meet the ever-changing demands of American industry and science.
The biosensor, developed by researchers at NIST, Brown University and the French research institute CEA-Leti , identifies biomarkers by measuring how binding
In a brightly lit subterranean lab at the National Institute of Standards and Technology (NIST) sits a room-sized electromechanical machine called the NIST-4
The new year 2023 brings accelerated expansion of a nationwide network of electric vehicle supply equipment (EVSE), supported by the U.S. Department of Energy
You learn the strangest things working in radio. Until the start of 2023, the US had two different specifications for what constituted the unit of measurement
The National Institute of Standards and Technology, the National Oceanic and Atmospheric Administration, Moss Landing Marine Laboratories and the University of
patent description (1) Disclosed is a barcoded end facet printed photonic chip comprising: an optically transparent direct laser writing substrate comprising a transverse waveguide writing surface to receive a direct write laser light for off-axis direct write laser printing and a facet surface to
patent description We invented a flow cytometer that can self-calibrate in an absolute way that can reach the sensitivity for quantification and enumeration of a single and small number of biological markers per a biological entity. The cytometer uses a photon-number resolving detector (or a
patent description The proposed invention is a method of producing a superconducting multi-layer transition sensor in which the first layer of the multilayer is deposited and patterned completely with a subtractive process before the subsequent layers are deposited and patterned using separate