Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

James G. Kushmerick (Fed)

PML Director

James G. Kushmerick is Director of the Physical Measurement Laboratory (PML) at the National Institute of Standards and Technology (NIST) where he is responsible for the maintenance, development, and dissemination of the U.S. national measurement standards. He also manages the full suite of NIST calibration services in dimensional, electromagnetic, ionizing radiation, mechanical, optical, thermodynamic, and time and frequency metrology. PML has more than 600 employees and 700 guest researchers at its Gaithersburg, MD and Boulder, CO. campuses, focused on determining definitive methods for nearly every kind of measurement employed in commerce and research, providing NIST-traceable calibrations and dissemination of standards and best practices throughout the nation, and exploring the outermost frontiers of metrology.

Dr. Kushmerick received a B.S. in Chemistry from the University of Delaware and a Ph.D. in Physical Chemistry from the Pennsylvania State University. Following postdoctoral research at Sandia National Laboratories, and four years as a Research Chemist at the Naval Research Laboratory, Jim joined the NIST staff in 2005 to continue his research focused on nanoscale electronics. The primary objective of his research was to understand the fundamentals of charge transport in nanoscale systems by exploiting in situ electronic and vibronic spectroscopies. He has over 50 publications including several in high-profile journals including Nature Materials, Nano Letters and ACS Nano, and holds four patents in the areas of directed assembly of nanoscale devices and monolayer-based nanoscale switches.


Surface Potential Imaging of Solution Processable Acene-Based Thin Film Transistors

Lucile C. Teague, Behrang H. Hamadani, John E. Anthony, David J. Gundlach, James G. Kushmerick, Sanker Subramanian, Thomas Jackson, Curt A. Richter, Oana Jurchescu
We report scanning Kelvin probe microscopy (SKPM) of electrically biased difluoro bis(triethylsilylethynyl) anthradithiophene (diF-TESADT) organic thin film
Created August 15, 2019, Updated December 8, 2022