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Microsystems and Nanotechnology Division

The Division advances nanofabrication technologies and uses them to develop innovative integrated measurement microsystems.

Welcome to the Microsystems and Nanotechnology Division

Historical advances in precision control of materials, devices, and information have led to multiple revolutions in science, technology, and industry. New measurement science has preceded each step forward – if we can measure it, then we can make it. Nanoscale measurements underly the ability to fabricate diverse nanotechnologies, create devices that manipulate photons, phonons, and plasmons at the quantum limit, and probe the structures and functions of atoms, (bio)molecules, and particles. Achieving control and understanding at the smallest scales requires new approaches. The Microsystems and Nanotechnology Division develops measurement science and technology to advance the state of the art of nanofabrication and nanomanufacturing and applies these novel capabilities to make innovative, integrated microsystems for critical applications.

The division works on three synergistic research thrusts: nanostructure fabrication and measurement; biophysical and biomedical measurement and technology; and photonics and optomechanics. Each of these is led by the corresponding group. Our major programs are listed below.

News and Updates

Projects and Programs

Atomic-force microscopy

Atomic-force microscopy is a reference method for traceable and correlative measurements of nanostructures. The Nanostructure Fabrication and Measurement Group

Biomolecular assembly

Biomolecular assembly allows the integration of nanoscale components into functional nanostructures. The Nanostructure Fabrication and Measurement Group


CNST Nanolithography Toolbox

The Nanolithography Toolbox is a platform-independent software package for scripted lithography pattern layout generation. The Center for Nanoscale Science and


MOSAIC is a modular single-molecule analysis toolbox to decode multi-state single-molecule and nanopore time-series data. Read the documentation for additional


Press Coverage



NIST Inventors
Marcelo Davanco
patent description The invention is an integrated photonic device which allows production of a pure stream of on-chip waveguide-bound indistinguishable single-photons from the resonance fluorescence of a single quantum emitter embedded in a multimode on-chip waveguide, for which the quantum emitter


NIST Inventors
Glenn Holland
patent description Disclosed is a non-vacuum, non-contact spinner wafer chuck for receiving and indexing a wafer, the non-vacuum, non-contact spinner wafer chuck comprising: a basal member comprising: a wafer-side surface; and a spinner-side surface opposing the wafer-side surface; a fastener
Patent description for Critical-Dimension Localization Microscopy

Apparatus for Critical-Dimension Localization Microscopy

NIST Inventors
Samuel M. Stavis and Craig Copeland
Patent Description Critical-Dimension Localization Microscopy (CDLM) is a new calibration and measurement method that establishes SI-traceability of optical microscopy and enables subnanometer localization accuracy over a submillimeter field. NIST fabricated arrays of sub-resolution apertures in an


Division Chief and Deputy Division Chief