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Patents

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Patent description for Critical-Dimension Localization Microscopy

Apparatus for Critical-Dimension Localization Microscopy

NIST Inventors
Samuel M. Stavis and Craig Copeland
Patent Description Critical-Dimension Localization Microscopy (CDLM) is a new calibration and measurement method that establishes SI-traceability of optical microscopy and enables subnanometer localization accuracy over a submillimeter field. NIST fabricated arrays of sub-resolution apertures in an