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NanoFab Tool: CEE Apogee Spinner
The CEE Apogee is a resist spinner system. The tool is used to uniformly apply photoresist on substrates ranging from 200 mm diameter wafers down to small pieces. All critical spin parameters are automatically controlled by user programmable recipes.
Specifications/Capabilities
- Manual coating of resist
- Maximum speed: 6000 RPM
- Unlimited number of user-defined recipe program steps
- Spin speed acceleration: 0 to 23,000 rpm/s
- Substrate size: piece to 200 mm
Typical Applications
- Photoresist coating
- Other material spin coated films
Created February 27, 2018, Updated February 24, 2023