Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Richard Kasica (Fed)

Richard Kasica is a Process Engineer in the CNST NanoFab Operations Group. Richard received a B.S. in Engineering Physics from the Ohio State University and an M.S. in Applied Physics from SUNY-Binghamton. Prior to joining NIST, he held positions at GE-CRD, Lucent Technologies, and Oak Ridge National Laboratory developing electron beam lithography based micro- and nanofabrication processes. He is currently responsible for operating the electron beam and laser writing lithography tools, and developing the associated fabrication processes.

Publications

Nanolithography Toolbox

Author(s)

Bojan R. Ilic, Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Neal A. Bertrand, Samuel M. Stavis, Vladimir A. Aksyuk, James A. Liddle, Brian A. Bryce, Nicolae Lobontiu, Yuxiang Liu, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Pavel Neuzil, Vojtech Svatos, Slava Krylov, Christopher B. Wallin, Ian J. Gilbert, Kristen A. Dill, Richard J. Kasica, Kartik A. Srinivasan, Gregory Simelgor, Juraj Topolancik

The Nanolithography Toolbox

Author(s)
Krishna Coimbatore Balram, Daron Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Richard Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Kartik Srinivasan, Samuel Stavis, Vladimir Aksyuk, James Alexander Liddle, Slava Krylov, Robert Ilic
This article describes a platform-independent software package for scripted lithography pattern layout generation and complex processing. The Nanolithography

Aspect-ratio driven evolution of high-order resonant modes and near-field distributions in localized surface phonon polariton nanostructures

Author(s)
Joseph G. Tischler, Chase T. Ellis, Orest Glembocki, Francisco Bezares, Alexander Giles, Richard Kasica, Loretta Shirley, Jeffrey C. Owrutsky, Dmitry Chigrin, Joshua Caldwell
Polar dielectrics have garnered much attention as an alternative to plasmonic metals in the mid- to long-wave infrared spectral regime due to their low optical
Created October 9, 2019, Updated June 15, 2021