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Richard Kasica

Richard Kasica is a Process Engineer in the CNST NanoFab Operations Group. Richard received a B.S. in Engineering Physics from the Ohio State University and an M.S. in Applied Physics from SUNY-Binghamton. Prior to joining NIST, he held positions at GE-CRD, Lucent Technologies, and Oak Ridge National Laboratory developing electron beam lithography based micro- and nanofabrication processes. He is currently responsible for operating the electron beam and laser writing lithography tools, and developing the associated fabrication processes.

Publications

The Nanolithography Toolbox

Author(s)
Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Richard J. Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Kartik A. Srinivasan, Samuel M. Stavis, Vladimir A. Aksyuk, James A. Liddle, Slava Krylov, Bojan R. Ilic
This article describes a platform-independent software package for scripted lithography pattern layout generation and complex processing. The Nanolithography

Nanolithography Toolbox

Author(s)
Bojan R. Ilic, Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Neal A. Bertrand, Samuel M. Stavis, Vladimir A. Aksyuk, James A. Liddle, Brian A. Bryce, Nicolae Lobontiu, Yuxiang Liu, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Pavel Neuzil, Vojtech Svatos, Slava Krylov, Christopher B. Wallin, Ian J. Gilbert, Kristen A. Dill, Richard J. Kasica, Kartik A. Srinivasan, Gregory Simelgor, Juraj Topolancik

Aspect-ratio driven evolution of high-order resonant modes and near-field distributions in localized surface phonon polariton nanostructures

Author(s)
Joseph G. Tischler, Chase T. Ellis, Orest Glembocki, Francisco Bezares, Alexander Giles, Richard J. Kasica, Loretta Shirley, Jeffrey C. Owrutsky, Dmitry Chigrin, Joshua Caldwell
Polar dielectrics have garnered much attention as an alternative to plasmonic metals in the mid- to long-wave infrared spectral regime due to their low optical
Created October 9, 2019