Krishna Coimbatore Balram, Daron A. Westly, Marcelo I. Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Richard J. Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith Metzler, Gerald Lopez, David Czaplewski, Leonidas Ocola, Kartik A. Srinivasan, Samuel M. Stavis, Vladimir A. Aksyuk, James A. Liddle, Slava Krylov, Bojan R. Ilic
This article describes a platform-independent software package for scripted lithography pattern layout generation and complex processing. The Nanolithography Toolbox, developed at the Center for Nanoscale Science and Technology (CNST) at the National Institute of Standards and Technology (NIST), was designed to help CNST NanoFab users create aggressively-scaled nanoscale device architectures. The Toolbox offers many parametrized shapes, including micro-and nanoelectromechanical systems (MEMS and NEMS) and nanophotonic device structure libraries. Using these shapes as building blocks, through scripting and programming, the Toolbox allows users to rapidly develop nanoscale pattern layouts of arbitrary complexity. Furthermore, the Toolbox allows users to precisely define the number of vertices for each shape or to create vectorized shapes using Bezier curves. The Toolbox can be applied to a broad range of micro- and nano-device fabrication tasks.