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Nanotechnology /Nanofabrication / manufacturing

Lithography

News and Updates

Projects and Programs

Atom-by-atom fabrication

Atom-scale Devices: Engineering, Metrology and Manufacturability

Ongoing
For these atomically defined devices, the exact position, type, number of atoms, and their arrangement, dramatically influence device behavior. By controlling the precise atomic makeup and geometry of a device it is possible to engineer a device’s electronic, quantum and mechanical structure to a
Three-dimensional view of carbon nanostructures grown on the surface of a glass fiber

Electron Microscopy of Carbon Nanotube Composites

Ongoing
Multi-wall CNTs (MWCNTs) are a common nano-carbon reinforcement material and are frequently dispersed into a polymer matrix to form composites that can be engineered with specific combinations of desirable properties – electrical, thermal, optical and mechanical, etc. However, this

Metrology for Nanoimprint Lithography

Completed
Nanoimprint Lithography (NIL) was originally perceived as a versatile, low-cost, and high-resolution patterning alternative for optical lithography in CMOS fabrication. However, it is becoming apparent that NIL has great potential for nanotechnology in general. It is capable of patterning sub-10 nm

Polymers for Next-Generation Lithography

Completed
We work closely with the semiconductor industry to develop and apply measurements with high-spatial and chemically-specific resolution to elucidate the critical materials properties and process kinetics at nanometer scales that are needed to advance next-generation photolithography, including both

Publications

Defining Chi for Block Copolymer Lithography

Author(s)
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

PHIDL: Python-based layout and geometry creation for nanolithography

Author(s)
Adam McCaughan, Alexander N. Tait, Sonia Buckley, Jeff Chiles, Jeff Shainline, Sae Woo Nam, Dylan M. Oh
Computer-aided design (CAD) has become a critical element in the creation of nanopatterned structures and devices. In particular, with the increased adoption of

Tools and Instruments

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