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Projects/Programs

Displaying 1 - 5 of 5

Metrology for Nanoimprint Lithography

Completed
Our goal is to develop, advance, and demonstrate measurements that facilitate Nanoimprint Lithography (NIL) as a viable technology for the patterning of robust

Polymers for Next-Generation Lithography

Completed
Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art