Additional Technical Details
- The target for NIL patterning is expanding from semiconductors devices to a range of technologies where nanoscale patterning has yet to be realized, including data storage media, high brightness LEDs, displays, sensors, and lab on a chip devices.
- NIST has emerged, in the face of diverging interests within the NIL community, as leaders in the materials and metrology needs for this rapidly expanding technology. We lead panel discussions and present numerous plenary/invited lectures on this topic at major conferences.
- NIST measurements of the residual stresses in the NIL process provide seminal insight for developing roll-to-roll imprint processes, spawning worldwide interest by several other research groups.
- First demonstration of the direct patterning of functional, ultralow-k dielectric insulator materials. Our measurements quantify the fidelity of the pattern transfer process and the unique way in which the NIL processes affect the porosity characteristics critical to the application.
Nanoimprint Manufacturing Station
Center for Nanotechnolgy, NIST
Project Summary (PDF)
Hitachi Data Storage