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Developing new metrology to characterize nano-structures in thin film and membrane using X-ray reflectivity (SXR), small angle x-ray scattering (SAXS), grazing incident small angle x-ray scattering (GI-SAXS) and small angle neutron scattering (SANS)
Study on the effects of confinement geometry on crosslinking density of UV nanoimprint resist
Developing advanced characterization methods for determining regular and irregular nano- and micro- scale patterns using SXR as a pattern shape metrology
Developing novel resist for high resolution e-beam lithography and fabricating reliable nano-patterns using newly developed resist
Structural characterization of porous thin films including porosity, average pore size, pore connectivity, pore size distribution, matrix density, average film density, and water uptake using SXR, SAXS, GI-SAXS, and SANS
Characterizing surface and interfacial structures and density depth profiles of thin films
Awards and Honors
MSEL Distinguished Associate Award (2007) Best Poster Award at MRS Spring Meeting (2001) Gold Medal Award at Samsung Semiconductor R & D Center Conference (1995)