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Liquids aren’t as well behaved in space as they are on Earth. Inside a spacecraft, microgravity allows liquids to freely slosh and float about. This behavior
NIST researchers have pioneered a process that drastically simplifies fabrication of the kind of nanoscale microchip features that may soon form the basis of a
The NIST Center for Nanoscale Science and Technology (CNST) Center for Nanoscale Science and Technology (CNST) is pleased to announce the release of the
The semiconductor industry's remarkable progress in making integrated circuits smaller, faster and cheaper relies on continual improvements in photolithography
Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art
The project focuses on significant metrology challenges that impede the advancement of high-performance optical and photonic systems. We develop, fabricate, and
Carbon nanomaterials such as carbon nanotubes (CNTs) and graphene have an extraordinary combination of mechanical, electronic and thermal properties that make
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength
Andrew Madison, John S. Villarrubia, Kuo-Tang Liao, Craig R. Copeland, Joshua Schumacher, Kerry Siebein, Robert Ilic, James Alexander Liddle, Samuel M. Stavis
Li-Anne Liew, David T. Read, May Martin, Todd R. Christenson, John T. Geaney
Photolithographically defined thin film Au dots were used as micro fiducial markers for digital image correlation (DIC), to enable two-dimensional strain
Wonil Nam, Junyeob Song, Seied Ali Safiabadi Tali, Henri Lezec, Amit Agrawal, Wei Zhou
Surface-enhanced Raman spectroscopy (SERS) has become a powerful technique for ultrasensitive biochemical detection providing molecular fingerprint information
The Suss MicroTec MA8 contact aligner allows users to align patterns on the front of a substrate and to print feature sizes down to 1 µm. The tool offers a
The Suss MicroTec MA6 contact aligner allows users to align patterns on the front or back of a substrate and to print feature sizes down to 1 µm. The tool
The JEOL JBX 6300-FS direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with feature