Lithography

News and Updates

NIST Designs a Prototype Fuel Gauge for Orbit

November 12, 2020

Liquids aren’t as well behaved in space as they are on Earth. Inside a spacecraft, microgravity allows liquids to freely slosh and float about. This behavior

Blazing a Path for Buried Bits in Quantum Chips

April 10, 2018

NIST researchers have pioneered a process that drastically simplifies fabrication of the kind of nanoscale microchip features that may soon form the basis of a

CNST Releases the Spring/Summer 2015 Edition of the CNST News

July 28, 2015

The NIST Center for Nanoscale Science and Technology (CNST) Center for Nanoscale Science and Technology (CNST) is pleased to announce the release of the

Projects and Programs

Single Molecule Fluorescence Measurements of Nanoscale Proton Distributions in Photoresist

Completed

The semiconductor industry's remarkable progress in making integrated circuits smaller, faster and cheaper relies on continual improvements in photolithography

Polymers for Next-Generation Lithography

Completed

Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art

Nano-Structured Optics and Optical Surface Metrology

Ongoing

The project focuses on significant metrology challenges that impede the advancement of high-performance optical and photonic systems. We develop, fabricate, and

Electron Microscopy of Carbon Nanotube Composites

Ongoing

Carbon nanomaterials such as carbon nanotubes (CNTs) and graphene have an extraordinary combination of mechanical, electronic and thermal properties that make

Publications

Defining Chi for Block Copolymer Lithography

January 11, 2023

Author(s)

Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey

Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

Unmasking the Resolution–Throughput Tradespace of Focused-Ion-Beam Machining

August 21, 2022

Author(s)

Andrew Madison, John S. Villarrubia, Kuo-Tang Liao, Craig R. Copeland, Joshua Schumacher, Kerry Siebein, Robert Ilic, James Alexander Liddle, Samuel M. Stavis

Microfabricated fiducial markers for digital image correlation-based micromechanical testing of LIGA Ni alloys

May 7, 2021

Author(s)

Li-Anne Liew, David T. Read, May Martin, Todd R. Christenson, John T. Geaney

Photolithographically defined thin film Au dots were used as micro fiducial markers for digital image correlation (DIC), to enable two-dimensional strain

Au/SiO2-Nanolaminated plasmonic nanoantennas as refractive-index-insensitive and transparent surface-enhanced raman spectroscopy substrates

March 10, 2021

Author(s)

Wonil Nam, Junyeob Song, Seied Ali Safiabadi Tali, Henri Lezec, Amit Agrawal, Wei Zhou

Surface-enhanced Raman spectroscopy (SERS) has become a powerful technique for ultrasensitive biochemical detection providing molecular fingerprint information

Lithography

News and Updates

NIST Designs a Prototype Fuel Gauge for Orbit

Blazing a Path for Buried Bits in Quantum Chips

CNST Releases the Spring/Summer 2015 Edition of the CNST News

Projects and Programs

Single Molecule Fluorescence Measurements of Nanoscale Proton Distributions in Photoresist

Polymers for Next-Generation Lithography

Nano-Structured Optics and Optical Surface Metrology

Electron Microscopy of Carbon Nanotube Composites

Publications

Defining Chi for Block Copolymer Lithography

Unmasking the Resolution–Throughput Tradespace of Focused-Ion-Beam Machining

Microfabricated fiducial markers for digital image correlation-based micromechanical testing of LIGA Ni alloys

Au/SiO2-Nanolaminated plasmonic nanoantennas as refractive-index-insensitive and transparent surface-enhanced raman spectroscopy substrates

Tools and Instruments

NanoFab Tool: Suss MicroTec MA8 Contact Aligner

NanoFab Tool: Suss MicroTec MA6/BA6 Contact Aligner

NanoFab Tool: JEOL JBX 6300-FS Direct Write Electron Beam Lithography System