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News and Updates

Projects and Programs

Polymers for Next-Generation Lithography

Completed
Our goal is to develop measurement methods with sufficiently high spatial resolution to uncover the materials limitations in the resolution of state-of-the-art

Publications

Defining Chi for Block Copolymer Lithography

Author(s)
Whitney Loo, Hongbo Feng, Thomas Ferron, Ricardo Ruiz, Daniel Sunday, Paul Nealey
Block copolymer lithography, such as directed self-assembly, requires the design of nanostructured block copolymers with precise values of segregation strength

Tools and Instruments