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New technologies are always invented in the labs at NIST every year. The researchers dedicate their time to discovering these new solutions to problems and
Cutting intricate patterns as small as several billionths of a meter deep and wide, the focused ion beam (FIB) is an essential tool for deconstructing and
Frances Lloyd was rejoining the workforce in 1977 after taking time off to raise her child. She had an impressive background. Frances worked on aircraft
Accurate production of nanoscale features on semiconductor chips is essential to their performance, but typical design tools cater to the dominance of straight
Neuromorphic computing is a radical new approach to information processing for artificial intelligence where, instead of using digital electronics, inspiration
This project aims to develop rigorous measurements and methodology needed for determining optical and electrical properties of advanced materials that might be
This project focuses on understanding the potential for nanoscale engineered materials to advance state-of-the-art spectroscopic techniques and foster the
PRIME (Platform for Realizing Integrated Molecule Experiments) aims to establish primary, quantum-based realizations for both the radiometric watt and kelvin
Ashish Chanana, Hugo Larocque, Renan Moreira, Jacques Carolan, Biswarup Guha, Emerson Goncalves De Melo, Vikas Anant, Jin Dong Song, Dirk Englund, Daniel Blumenthal, Marcelo Davanco, Kartik Srinivasan
Photon-based photonic quantum information systems require both scalable ultra-low loss photonic circuits and high-flux sources of single-photons. Direct
Jonathan Wyrick, Xiqiao Wang, Pradeep Namboodiri, Ranjit Kashid, Fan Fei, Joseph Fox, Richard M. Silver
Doping of Si using the scanning probe technique of hydrogen depassivation lithography has been shown to enable placing and positioning small numbers of P atoms
Lu Chen, Wenqi Zhu, Pengcheng Huo, Junyeob Song, Henri Lezec, Ting Xu, Amit Agrawal
The ability to control the instantaneous state of light – its phase, amplitude, polarization, or wavefront – of high-energy pulses down to the single-photon
There are few phrases truer for technological soothsaying than "fools rush in where angels fear to tread." Prediction is particularly difficult in the case of
MOSAIC is a modular single-molecule analysis toolbox to decode multi-state single-molecule and nanopore time-series data. Read the documentation for additional
The Denton Vacuum Infinity 22 electron beam evaporator vapor deposits thin films and is capable of loading up to six source materials for deposition. The
The Unaxis Shuttleline DSEII deep silicon etcher is an inductively coupled plasma (ICP) etching system used for etching deep features in silicon. The tool uses
The AllWin21 Downstream plasma asher uses heat and exposure to downstream oxygen radicals to remove resist and other organic materials. The cassette load system
This PlasmaTherm 790 reactive ion etcher (RIE) is a parallel plate plasma etching system which uses fluorocarbon and oxygen gases to etch silicon nitride thin