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NanoFab Tool: Microwave Asher

NanoFab Tool: Microwave Asher

The microwave plasma system is used for photoresist descum/removal and wafer cleaning. The system is equipped with a hand free door opening system for easy substrate loading/unloading.


  • Process gases: O2, N2 and CF4
  • Frequency: 2.45 GHz
  • Maximum Power: 1000 W
  • Wafer diameters: up to 150 mm 
  • Small pieces supported: Yes
  • Easy optical and e-beam resists removal

Usage Information

Operating Instructions


Typical Applications

  • Photoresist removal/descum and wafer cleaning.
Created July 9, 2019, Updated November 30, 2023