Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

NanoFab Tool: Filmetrics F40-UV Reflectometer

Filmetrics F40-UV Reflectometer

Filmetrics F40-UV Reflectometer

The Filmetrics F40-UV reflectometer provides users with rapid thin film thickness and optical constants measurements on most common device film stacks. The F40-UV combines a three objective microscope with an ultra-violet and visible light reflectance measurement system, allowing point specific film thickness and optical constants determination on substrates ranging from 200 mm diameter wafers down to small pieces.


  • Film thicknesses from several micrometers down to 4 nm.
  • Index of refraction and absorption determination (n and k).
  • Standard films:
    • Oxide on silicon.
    • Nitride on silicon.
    • Polysilicon on oxide on silicon.
    • Photoresist on silicon.
  • Integrated video camera allows observation of the sample position
  • Three microscope objectives: 15× for UV illumination; 5× and 50× for visible illumination
  • Measurement spot sizes: 10 µm, 33 µm, 100 µm.

Usage Information

Supported Sample Sizes

  • Maximum wafer diameter: 200 mm (8 in).
  • Small pieces supported: Yes.
  • Maximum thickness: 10 mm.

Typical Applications

  • Thickness verification of deposited or etched films.
  • Optical constants determination of deposited films.
  • Process characterization of patterned substrates.
Created October 21, 2014, Updated June 15, 2023