The Filmetrics F40-UV reflectometer provides users with rapid thin film thickness and optical constants measurements on most common device film stacks. The F40-UV combines a three objective microscope with an ultra-violet and visible light reflectance measurement system, allowing point specific film thickness and optical constants determination on substrates ranging from 200 mm diameter wafers down to small pieces.
Film thicknesses from several micrometers down to 4 nm.
Index of refraction and absorption determination (n and k).
Oxide on silicon.
Nitride on silicon.
Polysilicon on oxide on silicon.
Photoresist on silicon.
Integrated video camera allows observation of the sample position
Three microscope objectives: 15× for UV illumination; 5× and 50× for visible illumination
Measurement spot sizes: 10 µm, 33 µm, 100 µm.
Supported Sample Sizes
Maximum wafer diameter: 200 mm (8 in).
Small pieces supported: Yes.
Maximum thickness: 10 mm.
Thickness verification of deposited or etched films.
Optical constants determination of deposited films.