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Search Publications by: Joseph J. Kopanski (Assoc)

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Displaying 76 - 100 of 256

New Research in Nanotechnology - Nanotechnology Science and Technology Series

February 19, 2011
Author(s)
Michael T. Postek, Joseph J. Kopanski, David A. Wollman
NIST is developing a broad range of nanometrology (measurements) and nanomanufacturing techniques necessary for the successful commercialization of nanotechnology. This book is a compilation of a number of selected NIST accomplishments in nanotechnology

Conductive Carbon Nanotubes for Semiconductor Metrology

August 10, 2010
Author(s)
Joseph J. Kopanski, Victor H. Vartanian, Vladimir Mancevski, Phillip D. Rack, Ilona Sitnitsky, Matthew D. Bresin
This paper presents an evaluation of e-beam assisted deposition and welding of conductive carbon nanotube (c-CNT) tips for electrical scanning probe microscope measurements. Variations in CNT tip conductivity and contact resistance during fabrication were

Carbon nanotube applications to scanning probe microscopy for next generation semiconductor metrology

August 3, 2010
Author(s)
Victor H. Vartanian, Paul McClure, Vladimir Mancevski, Joseph Kopanski, Phillip D. Rack, Ilona Sitnitsky, Matthew D. Bresin, Vincent LaBella, Kathleen Dunn
This paper presents an evaluation of e-beam assisted deposition and welding of conductive carbon nanotube (c-CNT) tips for electrical scanning probe microscope measurements. Variations in CNT tip conductivity and contact resistance during fabrication were

Advanced Capacitance Metrology for Nanoelectronic Device Characterization

October 5, 2009
Author(s)
Curt A. Richter, Joseph J. Kopanski, Yicheng Wang, Muhammad Y. Afridi, Xiaoxiao Zhu, D. E. Ioannou, Qiliang Li, Chong Jiang
We designed and fabricated a test chip (consisting of an array of metal-oxide-semiconductor (MOS) capacitors and metal-insulator-metal (MIM) capacitors ranging from 0.3 fF to 1.2 pF) for use in evaluating the performance of new measurement approaches for

Test Chip to Evaluate Measurement Methods for Small Capacitances

March 30, 2009
Author(s)
Joseph J. Kopanski, Muhammad Y. Afridi, Chong Jiang, Curt A. Richter
We designed and fabricated a test chip to help us evaluate the performance of new approaches to measurement of small capacitances (femto-Farads to atto-Farads range). The test chip consists of an array of metal-oxide-semiconductor capacitors, metal

Scanning Probe Microscopy for Dielectric and Metal Characterization

June 10, 2008
Author(s)
Joseph J. Kopanski, Thomas R. Walker
The properties of both insulators and metals can be characterized capacitively with scanning probe microscopy, though the techniques employed are different. Intermittent contact scanning capacitance microscopy (IC-SCM) is a useful technique for

Scanning Kelvin Force Microscopy For Characterizing Nanostructures in Atmosphere

September 30, 2007
Author(s)
Joseph Kopanski, Muhammad Afridi, Stoyan Jeliazkov, Weirong Jiang, Thomas R. Walker
The Electrostatic Force Microscope (EFM) and its variants are of interest for the measurement of potential distributions within nanostructures, and for work function measurements of gate metals for next generation CMOS. In phase mode, the EFM measures