Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

A Model Database for Determining Dopant Profiles from Scanning Capacitance Microscope Measurements

Published

Author(s)

Jay F. Marchiando, Joseph Kopanski, J R. Lowney
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
April 6-9, 1997
Conference Location
Research Triangle Park, NC, USA

Citation

Marchiando, J. , Kopanski, J. and Lowney, J. (1997), A Model Database for Determining Dopant Profiles from Scanning Capacitance Microscope Measurements, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA (Accessed July 13, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1997, Updated October 12, 2021