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Scanning Capacitance Microscopy Measurement of 2-D Dopant Profiles across Junctions

Published

Author(s)

Joseph Kopanski, Jay F. Marchiando, David W. Berning
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
April 6-9, 1997
Conference Location
Research Triangle Park, NC, USA

Citation

Kopanski, J. , Marchiando, J. and Berning, D. (1997), Scanning Capacitance Microscopy Measurement of 2-D Dopant Profiles across Junctions, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA (Accessed June 22, 2024)

Issues

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Created December 30, 1997, Updated October 12, 2021