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Physical Measurement Laboratory / Sensor Science Division

Fluid Metrology Group

Index of Semiconductor Process Gases - Nitric Oxide

NITRIC
OXIDE

M.W. [1]

30.0061

N.B.P [2]

121.39 K

T.P [2]

109.51 K

Pc [3]

6.48 MPa

Tc [3]

180.15 K

Vc [3]

0.0580 m³/kmol

Note: In the tables, # is used for properties obtained from estimation methods. * and + are used to distinguish between differing data sets within a single column. If no uncertainty is specified, then no uncertainty was provided by the reference.

T K	$$ \frac{C_P^0(T)} {R} $$	Vapor Pressure MPa	B(T) cm³· mol^-1	dB/dT·T cm³· mol^-1	C(T) cm⁶· mol^-2	dC/dT·T cm⁶· mol^-2	λ mW/ (m·K)	η µPa·s
Estimated Uncertainty	*1%/+0.1%	-	Gas densities are calculated to better than 0.1% over the temperature and pressure ranges of the reference.				#5%	#5%
Reference	4	-	4	4	4	-	5	5
200	+3.72	-	-62.09	157.64	1296.94	-	#14.1	#17.8
210	+3.70	-	-54.78	142.24	1296.94	-	#14.6	#18.5
220	+3.69	-	-48.48	129.26	1296.94	-	#15.1	#19.3
230	+3.68	-	-42.98	118.22	1296.94	-	#15.6	#20.1
240	+3.66	-	-38.15	108.73	1296.94	-	#16.2	#20.8
250	+3.65	-	-33.89	100.51	1296.94	-	#16.7	#21.6
260	+3.64	-	-30.09	93.33	1296.94	-	#17.2	#22.3
270	+3.63	-	-26.68	87.02	1296.94	-	#17.7	#23.1
280	+3.62	-	-23.62	81.43	1296.94	-	#18.2	#23.8
290	+3.62	-	-20.85	76.45	1296.94	-	#18.7	#24.6
300	+3.61	-	-18.34	72.00	1296.94	-	#19.1	#25.3
310	+3.60	-	-16.04	68.00	1296.94	-	#19.6	#26.0
320	+3.60	-	-13.94	64.39	1296.94	-	#20.1	#26.8
330	+3.60	-	-12.01	61.11	1296.94	-	#20.6	#27.5
340	+3.59	-	-10.23	58.12	1296.94	-	#21.1	#28.2
350	+3.59	-	-8.59	55.40	1296.94	-	#21.6	#28.9
360	+3.59	-	-7.06	52.90	1296.94	-	#22.0	#29.7
370	+3.59	-	-5.65	50.60	1296.94	-	#22.5	#30.4
380	*3.59	-	-4.33	48.48	1296.94	-	#23.0	#31.1
390	*3.59	-	-3.09	46.52	1296.94	-	#23.4	#31.8
400	*3.59	-	-1.94	44.70	1296.94	-	#23.9	#32.5
410	*3.59	-	-0.85	43.01	1296.94	-	#24.3	#33.2
420	*3.59	-	0.16	41.44	1296.94	-	#24.8	#33.9
430	*3.59	-	1.12	39.97	1296.94	-	#25.3	#34.6
440	*3.60	-	2.02	38.59	1296.94	-	#25.7	#35.3
450	*3.60	-	2.88	37.31	1296.94	-	#26.1	#36.0
460	*3.60	-	3.68	36.10	1296.94	-	#26.6	#36.7
470	*3.61	-	4.45	34.96	1296.94	-	#27.0	#37.4
480	*3.61	-	5.17	33.89	1296.94	-	#27.5	#38.1
490	*3.62	-	5.86	32.88	1296.94	-	#27.9	#38.8
500	*3.62	-	6.51	31.93	1296.94	-	#28.3	#39.5
550	*3.66	-	9.36	27.85	1296.94	-	#30.4	#42.9
600	*3.69	-	11.64	24.67	1296.94	-	#32.5	#46.3
650	*3.73	-	13.51	22.12	1296.94	-	#34.4	#49.7
700	*3.77	-	15.07	20.03	1296.94	-	#36.3	#53.0
750	*3.82	-	16.39	18.30	1296.94	-	#38.1	#56.3
800	*3.86	-	17.52	16.83	1296.94	-	#39.8	#59.5
850	*3.89	-	18.50	15.58	1296.94	-	#41.4	#62.8
900	*3.93	-	19.36	14.50	1296.94	-	#43.0	#66.0
950	*3.97	-	20.12	13.55	1296.94	-	#44.5	#69.2
1000	*4.00	-	20.80	12.72	1296.94	-	#45.9	#72.3

References:

IUPAC, "Atomic Weights of the Elements 1999,: J. Phys. Chem. Ref. Data (2001, 30, 701).
Westrum, E.F., Stull, D.R., and Sinke, G.C., "The Chemical Thermodynamics of Organic Compounds," John Wiley and Sons, New York (1969).
Mathews, J.F., Chem. Rev., (1972, 72, 71).
Hurly, J.J., "Thermodynamic Properties of Nitrous Oxide and Nitric Oxide from Speed-of-Sound Measurements, Int. J. Thermophys. (2003, v24, 1611).
"Thermophysical Properties of Matter, IFI/Plenum, New York (1970, 13 Vols).

Footnote:

# is used for properties obtained from estimation methods.
* and + are used to distinguish between differing data sets within a single column.

Chemistry, Electronics, Semiconductors, Standards, Reference data and Reference materials

Contacts

Keith A Gillis

keith.gillis@nist.gov

(301) 975-2468
Michael R Moldover

michael.moldover@nist.gov

(301) 975-2459

Created December 31, 2009, Updated March 1, 2023