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Index of Semiconductor Process Gases

Note: In the tables, is used for properties obtained from estimation methods. * and + are used to distinguish between differing data sets within a single column. If no uncertainty is specified, then no uncertainty was provided by the reference.

Ammonia

NH3

Nitrous Oxide

N2O

Argon

Ar

Nitrogen Trifluoride

NF3

Allene

C3H4

Nitrogen

N2

Arsenic Trifluoride

AsF3

Oxygen

O2

Arsine

AsH3

Phosgene

COCl2

Trimethyl Arsine

As(CH3)3

Phosphourous Trifluoride

PF3

Diborane

B2H6

Phosphorous Pentafluoride

PF5

Pentaborane

B5H9

Phosphine

PH3

Boron Trichloride

BCl3

Sulfur Dioxide

SO2

Bromine

Br2

Stibine

SbH3

Carbon Dioxide

CO2

Silane

SiH4

Carbon Monoxide

CO

Disilane

Si2H6

Carbon Tetrafluoride

CF4

Silicon Tetrachloride

SiCl4

Chlorine

Cl2

Silicon Tetrafluoride

SiF4

Chlorine Trifluoride

ClF3

Sulfur Hexafluoride

SF6

Ethylene Oxide

C2H4O

Titanium Tetrachloride

TiCl4

Helium

He

Tungsten Hexafluoride

WF6

Hexafluoroethane

C2F6

Uranium Hexafluoride

UF6

Hydrogen

H2

Vinyl Bromide

C2H3Br

Hydrogen Bromide

HBr

Vinyl Fluoride

C2H3F

Hydrogen Chloride

HCl

Vinyl Chloride

C2H3Cl

Hydrogen Fluoride

HF

Trimethyl Gallium

Ga(CH3)3

Hydrogen Sulfide

H2S

Triethyl Gallium

Ga(C2H5)3

Molybdenum Hexafluoride

MoF6

Trimethyl Indium

In(C2H5)3

Nitric Oxide

NO

 

 


Footnote:

# is used for properties obtained from estimation methods.
* and + are used to distinguish between differing data sets within a single column.

Created December 1, 2009, Updated December 9, 2019