The Semiconductor Industry Association (SIA) International Technology Roadmap for Semiconductors (ITRS) identifies "Equipment Modeling" as first in a list of "Technology Requirements" and states that "the drivers for equipment modeling are equipment design, process control, . . . " The ITRS, later replaced by the International Roadmap for Devices and Systems (IRDS), indicates that continuing research is needed to obtain experimental data for "transport and thermal constants." This database contains transport and thermodynamic property data for some of the gases used in semiconductor processing. The data is useful for equipment modeling in chemical vapor deposition (CVD) processes and provides a rational basis for the calibration of mass flow controllers (MFCs) used to meter process gases.
Part of the CHIPS America Project is measuring the thermodynamic and transport properties of select process gases. The process gases are used in CVD and will be used to calibrate MFCs using our new flow standard. The results disseminated in this database provide the heat capacity, thermal conductivity, viscosity, and the virial coefficients for the virial equation of state providing the pressure-density-temperature relation for the process gases.
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Formerly known as SRD 134, but reclassified as a data compilation to be consistent with the Standard Reference Data Act of 1968 and, as amended, January 2017.