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Search Publications by: Eric C. Benck (Fed)

Displaying 26 - 50 of 53

Submillimeter-Wavelength Plasma Diagnostics For Semiconductor Manufacturing, ed. by D.G. Seiler, A.C. Diebold, T.J. Schaffner, R. McDonald, S. Zollner, R.P. Khosla, and E.M. Secula

March 1, 2003

Author(s)

Eric C. Benck, G Y. Golubiatnikov, Gerald T. Fraser, D L. Pluesquelic, B Ji, S A. Motika, E J. Karwacki

Transition From E to H Mode Discharge in Pulse-Modulated Inductively Coupled Plasmas

March 1, 2003

Author(s)

M Edamura, Eric C. Benck

Time-resolved measurements of pulse-modulated inductively coupled plasmas were carried out by using a Langmuir probe. It was found that under a certain condition (a mixture of 20 % O2 and 80 % Ar, a pressure of 2.67 Pa, a radio-frequency power of 200 W, a

C 4 F 6 - 1,3 Hexafluorobutadiene - A New Etching Gas: Studies on Material Compatibility, Behavior in an Inductively Coupled Plasma and Etch Process Performance

January 1, 2003

Author(s)

A Nicoletti, P Srinivasan, M Riva, Eric C. Benck, A Goyette, Ying-ju Wang, J M. Kim, P Hsieh, A Athayde, Abhay Joshi

Continuous-wave terahertz spectroscopy of biomolecules and plasmas, ed. by D.L. Wollard, W.R. Loerop, and M.S.Shur

January 1, 2003

Author(s)

David F. Plusquellic, T M. Korter, Gerald T. Fraser, R J. Lavrich, Eric C. Benck, C R. Bucher, J Domench, Angela R. Hight Walker

Ion energy distribution and optical measurements in high-density, inductively coupled C4F6 discharges

January 1, 2003

Author(s)

Eric C. Benck, A Goyette, J C. Wang

Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing

January 1, 2003

Author(s)

Eric C. Benck, G Y. Golubiatnikov, Gerald T. Fraser, B Ji, S A. Motika, E J. Karwacki

Submillimeter-Wavelength Plasma Chemical Diagnostics for Semiconductor Manufacturing

January 1, 2003

Author(s)

Eric C. Benck, G Y. Golubiatnikov, Gerald T. Fraser, B Ji, S A. Motika, E J. Karwacki

Transition from E to H mode discharge in pulse-modulated inductively coupled plasmas

January 1, 2003

Author(s)

M Edamura, Eric C. Benck

Fiber Optic Based Optical Tomography Sensor for Monitoring Plasma Uniformity

February 1, 2001

Author(s)

Eric C. Benck, K Etemadi

A new type of fiber optic based optical tomography sensor has been developed for potential in situ monitoring of plasma uniformity. Optical tomography inverts optical emission measurements into the actual plasma distribution without assuming radial

Time Evolution of Ion Energy Distributions and Optical Emission in Pulsed Inductively Coupled Radio Frequency Plasmas

October 1, 2000

Author(s)

Martin Misakian, Eric C. Benck, Yicheng Wang

This article reports the results of time-resolved measurements of ion energy distributions (IEDs), relative ion densities, as well as optical emissions and electrical characteristics in pulsed, inductively coupled plasmas for the simple gas mixture of

Fiber Optic Based Optical Tomography Sensor for Monitoring Plasma Uniformity, ed. by D.G. Seiler

June 1, 2000

Author(s)

Eric C. Benck, K Etemadi

Time-resolved Measurements of Ion Energy Distributions and Optical Emissions in Pulsed Radio-Frequency Discharges

March 1, 2000

Author(s)

Yicheng Wang, Eric C. Benck, Martin Misakian, M. Edamura, James K. Olthoff

In pulse-modulated inductively coupled plasmas generated in CF 4:Ar mixtures, a transition between a capacitive coupling mode (E mode) and an inductive coupling mode (H mode) was observed. For a pulsed plasma in a 50%CF 4:50%Ar volume mixture with the peak

Time evolution of ion energy distributions and optical emission in pulsed inductively coupled radio frequency plasmas

January 1, 2000

Author(s)

M Misakian, Eric C. Benck, Ying-ju Wang

Optical Computer Aided Tomography for Plasma Uniformity Measurements

July 1, 1998

Author(s)

Eric C. Benck

Optical Computer aided tomography (CAT) is being investigated as a potential in situ diagnostic for measuring plasma uniformity without making assumptions concerning the plasma symmetry. The presence of an opaque vacuum chamber wall severely limits the

Optical Computer Aided Tomography Measurements of Plasma Uniformity in an Inductively Coupled Discharge

July 1, 1998

Author(s)

Eric C. Benck, J R. Roberts

Optical computer aided tomography (CAT) is being investigated as a potential in situ diagnostic for measuring plasma uniformity without making assumptions concerning the plasma symmetry. The presence of an opaque vacuum chamber wall severely limits the

Optical computer aided tomography for plasma uniformity measurements

June 1, 1998

Author(s)

Eric C. Benck, J R. Roberts

Optical computer aided tomography measurements of plasma uniformity in an inductively coupled discharge, ed. by Seiler, D.G., Diebold, A.C., Bullis, W.M., Shaffner, T.J., McDonald, R., and Walters, E.J.

March 1, 1998

Author(s)

Eric C. Benck, J R. Roberts

Optical Computer Aided Tomography of an Inductively Coupled Discharge

March 1, 1998

Author(s)

Eric C. Benck, J R. Roberts

Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes

January 1, 1998

Author(s)

A Schwabedissen, Eric C. Benck, J R. Roberts

Comparison of Electron Density Measurements in Planar Inductively Coupled Plasmas by Means of the Plasma Oscillation Method and Lanqmuir Probes

January 1, 1998

Author(s)

A Schwabedissen, Eric C. Benck, J R. Roberts

The absolute, spatially resolved electron densities in planar inductively coupled plasmas have been measured by two different plasma diagnostic techniques, the plasma diagnostic techniques, the plasma oscillation method and Langmuir probes. In the plasma