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Optical computer aided tomography for plasma uniformity measurements

Published

Author(s)

Eric C. Benck, J R. Roberts
Proceedings Title
The Fourth International Workshop on Advanced Plasma Tools and Process Engineering
Conference Dates
May 26-27, 1998
Conference Location
Millbrae, CA
Conference Title
Proc. Plasma Etch Users Group: The Fourth International Workshop on Advanced Plasma Tools and Process Engineering

Citation

Benck, E. and Roberts, J. (1998), Optical computer aided tomography for plasma uniformity measurements, The Fourth International Workshop on Advanced Plasma Tools and Process Engineering , Millbrae, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=101927 (Accessed April 20, 2024)
Created June 1, 1998, Updated February 17, 2017