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Submillimeter-Wavelength Plasma Diagnostics For Semiconductor Manufacturing, ed. by D.G. Seiler, A.C. Diebold, T.J. Schaffner, R. McDonald, S. Zollner, R.P. Khosla, and E.M. Secula

Published

Author(s)

Eric C. Benck, G Y. Golubiatnikov, Gerald T. Fraser, D L. Pluesquelic, B Ji, S A. Motika, E J. Karwacki
Proceedings Title
Characterization and Metrology for ULSI Technology: 2003 International Conference
Volume
C
Conference Dates
March 24-28, 2003
Conference Location
Austin, TX
Conference Title
Proc. 2003 International Conference

Citation

Benck, E. , Golubiatnikov, G. , Fraser, G. , Pluesquelic, D. , Ji, B. , Motika, S. and Karwacki, E. (2003), Submillimeter-Wavelength Plasma Diagnostics For Semiconductor Manufacturing, ed. by D.G. Seiler, A.C. Diebold, T.J. Schaffner, R. McDonald, S. Zollner, R.P. Khosla, and E.M. Secula, Characterization and Metrology for ULSI Technology: 2003 International Conference, Austin, TX (Accessed August 12, 2022)
Created March 1, 2003, Updated February 17, 2017