November 1, 1997
Author(s)
R Farrow, Michael T. Postek, William J. Keery, Samuel N. Jones, J R. Lowney, M Blakey, L Fetter, A Liddle, L C. Hopkins, H A. Huggins, M Peabody, A Novembre, J Griffith
… were performed on a 4X scattering with angular limitation in projection electron lithography (SCALPEL) e-beam … lithography mask using the transmitted electron signal in a modified scanning electron microscope. Features as small … measurement accuracy is mostly limited by the variations in the material and not the measurement system. It is …