Gillaspy, J.
, Parks, D.
and Ratliff, L.
(1998),
Highly Charged Ion Masked Ion Beam Lithography, Journal of Vacuum Science and Technology B
(Accessed May 10, 2025)
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Highly Charged Ion Masked Ion Beam Lithography
Published
Author(s)
, D C. Parks,
Citation
Journal of Vacuum Science and Technology B
Volume
16
Pub Type
Journals
Citation
Issues
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Created January 1, 1998, Updated February 17, 2017