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Search Publications by: Eric K. Lin (Fed)

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Displaying 176 - 200 of 392

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

July 19, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Eric K. Lin, Jack F. Douglas, Sushil K. Satija, D L. Goldfarb, H Ito
The depth profile of the counterion concentration within thin polyelectrolyte films was measured in situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution.Wefind substantial counterion

Direct Measurement of the Counterion Distribution Within Swollen Polyelectrolyte Films

May 20, 2005
Author(s)
Vivek M. Prabhu, B D. Vogt, Wen-Li Wu, Jack F. Douglas, Eric K. Lin, Sushil K. Satija, D M. Goldfarb, H Ito
A depth profile of the counterion concentration within thin polyelectrolyte films was measured in-situ using contrast variant specular neutron reflectivity to characterize the initial swelling stage of the film dissolution. We find a substantial counterion

Characterization of Ordered Mesoporous Silica Films Using Small-Angle Neutron Scattering and X Ray Porosimetry

March 1, 2005
Author(s)
B D. Vogt, R A. Pai, V. J. Lee, R C. Hedden, Christopher L. Soles, Wen-Li Wu, Eric K. Lin, Barry J. Bauer, J J. Watkins
Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-bPPO-b-PEO,films doped with p-toluenesulfonic acid (p-TSA)

X-ray Absorption Spectroscopy to Probe Surface Composition and Surface Deprotection in Photoresist Films

March 1, 2005
Author(s)
Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Daniel A. Fischer, S Sambasivan, Eric K. Lin, Ronald L. Jones, Christopher Soles, Wen-Li Wu, D M. Goldfarb, M Angelopoulos
We utilize near edge x-ray absorption fine structure spectroscopy (NEXAFS) to provide chemical insight into surface chemical effects in model photo-resist films. First, NEXAFS was used to examine the resist/air interface including surface segregration of a

Characterization of Ordered Mesoporous Silica Films Using Small Angle Neutron Scattering and X-Ray Porosimetry

February 23, 2005
Author(s)
B D. Vogt, R A. Pai, Hae-Jeong Lee, R C. Hedden, Christopher L. Soles, Wen-Li Wu, Eric K. Lin, Barry J. Bauer, J J. Watkins
Ordered mesoporous silica films were synthesized using pre-organized block copolymer templates in supercritical carbon dioxide. Poly(ethylene oxide-block-propylene oxide-block-ethylene oxide), PEO-b-PPO-b-PEO, films doped with p-toluenesulfonic acid (p TSA

Water Distribution Within Immersed Polymer Films

February 1, 2005
Author(s)
B D. Vogt, Christopher Soles, Vivek Prabhu, Sushil K. Satija, Eric K. Lin, Wen-Li Wu
The emergence of immersion lithography as a potential alternative for the extension of current lithography tools will require a fundamental understanding of the interactions between the photoresist and the immersion liquid such as water. The water

Water Immersion of Model Photoresists: Interfacial Influences on Water Concentration and Surface Morphology

February 1, 2005
Author(s)
B D. Vogt, D L. Goldfarb, M Angelopoulos, Christopher Soles, C M. Wang, Vivek Prabhu, P M. McGuiggan, Jack F. Douglas, Eric K. Lin, Wen-Li Wu, Sushil K. Satija
Immersion lithography has emerged as an alternative to the 157 nm node and as such understanding of the interactions between the photoresist and immersion fluid (water) has become a pressing issue. The water concentration within the model photoresist films