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Confinement Induced Deviation in Ultra-thin Photoresist Films

Published

Author(s)

Christopher L. Soles, Eric K. Lin, Wen-Li Wu, Q Lin, M Angelopoulos
Conference Location
Brookfield, CT
Conference Title
Proceedings of the 12th International Conference on Photopolymers

Keywords

Electronic Materials, Lithography, Reflectivity, Thermal Properties, Thin Films, confinement, dynamics, glass transition, lithography, neutron scattering, thermal expansion, thin films

Citation

Soles, C. , Lin, E. , Wu, W. , Lin, Q. and Angelopoulos, M. (2001), Confinement Induced Deviation in Ultra-thin Photoresist Films, Proceedings of the 12th International Conference on Photopolymers, Brookfield, CT, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853792 (Accessed April 12, 2024)
Created January 1, 2001, Updated February 17, 2017