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PUBLICATIONS

Confinement Induced Deviation in Ultra-thin Photoresist Films

Published

Author(s)

Christopher L. Soles, Eric K. Lin, Wen-Li Wu, Q Lin, M Angelopoulos
Conference Location
Brookfield, CT
Conference Title
Proceedings of the 12th International Conference on Photopolymers
Pub Type
Conferences

Download Paper

Local Download

Keywords

Electronic Materials, Lithography, Reflectivity, Thermal Properties, Thin Films, confinement, dynamics, glass transition, lithography, neutron scattering, thermal expansion, thin films

Citation

Soles, C. , Lin, E. , Wu, W. , Lin, Q. and Angelopoulos, M. (2001), Confinement Induced Deviation in Ultra-thin Photoresist Films, Proceedings of the 12th International Conference on Photopolymers, Brookfield, CT, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853792 (Accessed October 8, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 1, 2001, Updated February 17, 2017
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