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Search Publications by: Eric K. Lin (Fed)

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Displaying 151 - 175 of 392

Fundamentals of the Reaction-Diffusion Process in Model EUV Photoresists

March 1, 2006
Author(s)
Kristopher Lavery, George Thompson, Hai Deng, D S. Fryer, Kwang-Woo Choi, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Sushil K. Satija, Michael Leeson, Heidi B. Cao
More demanding requirements are being made of photoresist materials for fabrication of nanostructures as the feature critical dimensions (CD) decrease. For EUV resists, control of line width roughness (LWR) and high resist sensitivity are key requirements

Dissolution Fundamentals of 193-nm Methacrylate Based Photoresists

February 19, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek Prabhu, Eric K. Lin, Wen-Li Wu, Karen Turnquest, W D. Hinsberg
The dissolution of partially deprotected chemically amplified photoresists is the final step in printing lithographic features. Since this process step can be tuned independently from the design of the photoresist chemistry, fundamental measurements of the

Effect of Initial Resist Thickness on Residual Layer Thickness of Nanoimprinted Structures

December 1, 2005
Author(s)
Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles, Ronald L. Jones, Eric K. Lin, Wen-Li Wu, Daniel R. Hines
Accurate quantification and control of the residual layer thickness is a critical challenge to achieving sub-50 nm patterning with nanoimprint lithography. While characterization to within a few nanometers is essential, there is currently a lack of

Self-Assembly, Molecular Ordering, and Charge Mobility in Solution-Processed Ultrathin Oligothiophene Films

November 29, 2005
Author(s)
A R. Murphy, Paul C. Chang, Priscilla VanDyke, J Liu, J M. Frechet, V Subramanian, Dean DeLongchamp, S Sambasivan, Daniel A. Fischer, Eric K. Lin
Symmetrical quarter-(T4), penta-(T5), sexi-(T6), and heptathiophene (T7) oligomers containing thermally removable aliphatic ester solubilizing groups were synthesized, and their UV-vis and thermal characteristics were compared. Spun-cast thin films of each

Variations in Semiconducting Polymer Microstructure and Hole Mobility With Spin-Coating Speed

November 15, 2005
Author(s)
Dean M. DeLongchamp, Brandon M. Vogel, Youngsuk Jung, Curt A. Richter, Oleg A. Kirillov, Jan Obrzut, Daniel A. Fischer, S Sambasivan, Marc Gurau, Lee J. Richter, Eric K. Lin
Organic semiconductors permit low-cost processing methods such as spin-coating, dip coating, or ink-jet printing onto flexible substrates. However, the performance of these materials in devices is difficult to control and new processing methods can deliver

Direct Correlation of Organic Semiconductor Film Structure to Field-Effect Mobility

August 1, 2005
Author(s)
Dean M. DeLongchamp, S Sambasivan, Daniel A. Fischer, Eric K. Lin, Paul C. Chang, A R. Murphy, J M. Frechet, V Subramanian
Recent efforts towards the large-scale adoption of organic electronics have focused on maximizing device performance using new molecular designs and processing strategies. However, rational design and systematic progress are hindered by insufficient