Feature-Shape and Line-Edge Roughness Measurement of Deep Submicron Lithographic Structures Using Small-Angle Neutron Scattering

Published

August 1, 2001

Author(s)

Eric K. Lin, Wen-Li Wu, Q H. Lin, M Angelopoulos

Abstract

We demonstrate the application of small angle neutron scattering (SANS) measurements for the quick, nondestructive, and quantitative measurement of the feature shape and size and line-edge roughness of lithographically prepared structures using a model photoresist pattern consisting of a periodic grating of 0.15 υm lines. The measurements are performed directly on structures as fabricated on a silicon wafer with no other sample preparation. For well-defined patterns placed normal to the neutron beam, we easily observe up to six orders of diffraction peaks. Analytic expressions from standard small angle scattering formalism are used to extract the average line structure, spacing, and line-edge roughness from the peak positions and intensities. Additional structural information is obtained by tilting the pattern relative to the incident beam. Changes in the observed scattering data as a function of the tilting angle are related to characteristics such as the height of the structures and the symmetry of the line shape.

Proceedings Title

Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE

Volume

4344

Conference Dates

February 1, 2001

Conference Title

Proceedings of SPIE--the International Society for Optical Engineering

Pub Type

Conferences

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Keywords

critical dimension, line-edge roughness, microlithography, small angle neutron scattering

Citation

Lin, E. , Wu, W. , Lin, Q. and Angelopoulos, M. (2001), Feature-Shape and Line-Edge Roughness Measurement of Deep Submicron Lithographic Structures Using Small-Angle Neutron Scattering, Metrology, Inspection and Process Control for Microlithography, Conference | 15th | Metrology, Inspection and Process Control for Microlithography XV | SPIE, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851833 (Accessed October 20, 2025)