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Search Publications by: Eric K. Lin (Fed)

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Displaying 126 - 150 of 392

Thickness Dependence of Microstructure in Semiconducting Films of an Oligofluorene Derivative

December 7, 2006
Author(s)
Dean M. DeLongchamp, Mang-Mang Ling, Youngsuk Jung, Daniel A. Fischer, Mark Roberts, Eric K. Lin, Zhenan Bao
The measurement and optimization of microstructure development in organic semiconductor films is valuable because microstructure in many cases critically impacts electronic performance. We demonstrate a general method to measure microstructure thickness

Evidence for Internal Stresses Induced by Nanoimprint Lithography

November 30, 2006
Author(s)
Hyun Wook Ro, Yifu Ding, Hae-Jeong Lee, Daniel R. Hines, Ronald L. Jones, Eric K. Lin, Alamgir Karim, Wen-Li Wu, Christopher L. Soles
The thermal embossing form of nanoimprint lithography is used to pattern arrays of nanostructures into several different polymer films. The shape of the imprinted patterns is characterized with nm precision using both X-ray scattering and reflectivity

The Effect of Deprotection Extent on Swelling and Dissolution Regimes of Thin Polymer Films

October 28, 2006
Author(s)
Ashwin Rao, Shuhui Kang, B D. Vogt, Vivek M. Prabhu, Eric K. Lin, Wen-Li Wu, M Muthukumar
The response of unentangled polymer thin films to aqueous hydroxide solutions is measured as a function of increasing weakly-acidic methacrylic acid comonomer content produced by an in-situ reaction-diffusion process. Quartz crystal microbalance with

Structural Characteristics of Methylsilsesquioxane Based Porous Low-k Thin Films Fabricated with Increasing Cross-Linked Particle Porogen Loading

September 1, 2006
Author(s)
Hae-Jeong Lee, Christopher L. Soles, Da-Wei Liu, Barry J. Bauer, Eric K. Lin, Wen-Li Wu
Methylsilsesquioxane (MSQ) based porous low-k dielectric films with different porogen loading have been characterized using X-ray porosimetry (XRP) to determine their pore size distribution, average density, wall density and porosity. By varying the

Deprotection Kinetics in 193 nm Photoresist Thin Films: Influence of Copolymer Content

July 25, 2006
Author(s)
Shuhui Kang, Vivek M. Prabhu, B D. Vogt, Eric K. Lin, Wen-Li Wu, Karen Turnquest
The reaction-diffusion mechanism of photoacids is dependent upon many variables including the reaction rate, size of the acid counterion species and temperature. Recent experiments have demonstrated the acid diffusion can be controlled by a combination of

Real Time Shape Evolution of Nanoimprinted Polymer Structures During Thermal Annealing

July 18, 2006
Author(s)
Ronald L. Jones, T Hu, Christopher L. Soles, Eric K. Lin, R M. Reano, Stella W. Pang, D M. Casa
The real time shape of nanoimprinted polymer patterns are measured as a function of annealing temperature and time using a new metrology technique, Critical Dimension Small Angle X-ray Scattering (CD-SAXS). Periodicity, linewidth, line height, and sidewall

Correlating Molecular Design to Microstructure in Thermally Convertible Oligothiophenes: The Effect of Branched versus Linear End Groups

June 8, 2006
Author(s)
Dean M. DeLongchamp, Youngsuk Jung, Daniel A. Fischer, Eric K. Lin, P C. Chang, V Subramanian, A R. Murphy, J M. Frechet
The thin film microstructure development of functionalized oligothiophenes with branched, thermally removable groups at each end of conjugated cores with five, six, and seven thiophene rings was monitored during their thermal conversion from solution

Effects of Humidity on Unencapsulated Poly(thiophene) Thin Film Transistors

March 13, 2006
Author(s)
Michael L. Chabinyc, Fred Endicott, B D. Vogt, Dean DeLongchamp, Eric K. Lin, Yiliang Wu, Ping Liu, Beng S. Ong
The effects of humidity on unencapsulated polymeric thin-film transistors (TFTs) were investigated. TFTs were fabricated on glass substrates with inorganic gate dielectric and a semiconducting layer of poly[5,5 -bis(3-dodecyl-2-thienyl)-2,2 -bithiophene]