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Structural Characterization of Methylsilsesquioxane-Based Porous Low-k using X-ray Porosimetry

Published

Author(s)

V. J. Lee, Christopher Soles, D W. Liu, Barry J. Bauer, Eric K. Lin, Wen-Li Wu
Conference Location
Burlingame, CA
Conference Title
International Interconnect Technology Conference (IITC) Proceeding

Keywords

pore size distribution, porosity, porous low-k dielectric, small angle neutron scattering, x-ray porosimetry, x-ray reflectivity

Citation

Lee, V. , Soles, C. , Liu, D. , Bauer, B. , Lin, E. and Wu, W. (2003), Structural Characterization of Methylsilsesquioxane-Based Porous Low-k using X-ray Porosimetry, International Interconnect Technology Conference (IITC) Proceeding, Burlingame, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853912 (Accessed March 1, 2024)
Created December 31, 2002, Updated October 12, 2021