Incoherent Neutron Scattering and the Dynamics of Thin Film Photoresist Polymers

Published

February 1, 2003

Author(s)

Christopher L. Soles, Jack F. Douglas, Eric K. Lin, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Wen-Li Wu, D M. Goldfarb, M Angelopoulos

Abstract

Elastic incoherent neutron scattering is employed to parameterize changes in the atomic/molecular mobility in lithographic polymers as a function of film thickness. Changes in the 200 MHz and faster dynamics are estimated in terms of a harmonic oscillator model and the corresponding Debye-Waller factor mean-square atomic displacement . We generally observe that relatively large values in the glassy state lead to a strong suppression of when the polymer is confined to exceedingly thin films, while this suppression is diminished or even absent if in the glass is relatively small. We also find that highly localized side group or segmental dynamics of hydrogen-rich moeities, such as methyl groups, can dominate and that thin film confinement apparently suppresses these motions. With respect to photolithography, we demonstrate that a reduced corresponds to a sharp decrease in the reaction from propagation kinetics.

Citation

Journal of Applied Physics

Volume

93

Issue

No. 4

Pub Type

Journals

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Keywords

conlinement, dynamics, lithography neutron scattering, thinfilms

Citation

Soles, C. , Douglas, J. , Lin, E. , Lenhart, J. , Jones, R. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2003), Incoherent Neutron Scattering and the Dynamics of Thin Film Photoresist Polymers, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=852097 (Accessed October 6, 2024)