Jablonski, E.
, Sambasivan, S.
, Lin, E.
, Fischer, D.
, Devadoss, C.
and Puligadda, R.
(2003),
Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853911
(Accessed April 19, 2024)
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Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist
Published
Author(s)
, S Sambasivan, , , C Devadoss, R Puligadda
Citation
Journal of Vacuum Science and Technology B
Volume
21(6)
Pub Type
Journals
Download Paper
Keywords
157 nm photoresists, Diffusion, Electronic Materials, Formulations, Lithography, NEXAFS, Spectroscopy, Thin Films, lithography, polymer blend, surface segregation, thin film
Citation
Created January 1, 2003, Updated February 17, 2017