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Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist

Published

Author(s)

E Jablonski, S Sambasivan, Eric K. Lin, Daniel A. Fischer, C Devadoss, R Puligadda
Citation
Journal of Vacuum Science and Technology B
Volume
21(6)

Keywords

157 nm photoresists, Diffusion, Electronic Materials, Formulations, Lithography, NEXAFS, Spectroscopy, Thin Films, lithography, polymer blend, surface segregation, thin film

Citation

Jablonski, E. , Sambasivan, S. , Lin, E. , Fischer, D. , Devadoss, C. and Puligadda, R. (2003), Near Edge X-Ray Absorption Fine Structure Measurements of the Interface between Bottom Antireflective Coatings and a Model Deprotected Photoresist, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853911 (Accessed April 14, 2024)
Created January 1, 2003, Updated February 17, 2017