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PUBLICATIONS

Small Angle X-ray Scattering as a Tool for Sub-100 nm Pattern Characterization

Published

Author(s)

Ronald L. Jones, T Hu, Eric K. Lin, Wen-Li Wu, R Kolb, D M. Casa, P J. Bolton, Z Barclay
Citation
Applied Physics Letters
Volume
83(19)
Pub Type
Journals

Download Paper

Local Download

Keywords

Electronic Materials, Lithography, Microscopy, Nanostructured Materials, Scattering, nanostructures, photolithography, semiconductor metrology, small angle x-ray scattering

Citation

Jones, R. , Hu, T. , Lin, E. , Wu, W. , Kolb, R. , Casa, D. , Bolton, P. and Barclay, Z. (2003), Small Angle X-ray Scattering as a Tool for Sub-100 nm Pattern Characterization, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853894 (Accessed October 22, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 31, 2002, Updated October 12, 2021
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