Jones, R.
, Hu, T.
, Lin, E.
, Wu, W.
, Kolb, R.
, Casa, D.
, Bolton, P.
and Barclay, Z.
(2003),
Small Angle X-ray Scattering as a Tool for Sub-100 nm Pattern Characterization, Applied Physics Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853894
(Accessed October 5, 2024)
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Small Angle X-ray Scattering as a Tool for Sub-100 nm Pattern Characterization
Published
Author(s)
, , , , , D M. Casa, P J. Bolton, Z Barclay
Citation
Applied Physics Letters
Volume
83(19)
Pub Type
Journals
Download Paper
Keywords
Electronic Materials, Lithography, Microscopy, Nanostructured Materials, Scattering, nanostructures, photolithography, semiconductor metrology, small angle x-ray scattering
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2002, Updated October 12, 2021