Wang, M.
, Lin, E.
, Karim, A.
and Fasolka, M.
(2003),
Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists, Characterization and Metrology for ULSI Technology: 2003 International Conference, Austin, TX, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853895
(Accessed September 13, 2024)
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Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists
Published
Author(s)
M Wang, , ,
Conference Location
Austin, TX
Conference Title
Characterization and Metrology for ULSI Technology: 2003 International Conference
Pub Type
Conferences
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Keywords
Combinatorial and THE Methods, Lithography, Thin Films, chemically amplified resist, combinatorial method, thin film
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created December 31, 2002, Updated October 12, 2021