Combinatorial and THE Methods, Lithography, Thin Films, chemically amplified resist, combinatorial method, thin film
, Lin, E.
, Karim, A.
and Fasolka, M.
Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists, Characterization and Metrology for ULSI Technology: 2003 International Conference, Austin, TX, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853895
(Accessed December 11, 2023)