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Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists

Published

Author(s)

M Wang, Eric K. Lin, Alamgir Karim, Michael J. Fasolka
Conference Location
Austin, TX
Conference Title
Characterization and Metrology for ULSI Technology: 2003 International Conference

Keywords

Combinatorial and THE Methods, Lithography, Thin Films, chemically amplified resist, combinatorial method, thin film

Citation

Wang, M. , Lin, E. , Karim, A. and Fasolka, M. (2003), Combinatorial Methods Study of Confinement Effects on the Reaction Front in Ultrathin Chemically Amplified Photoresists, Characterization and Metrology for ULSI Technology: 2003 International Conference, Austin, TX, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853895 (Accessed May 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2002, Updated October 12, 2021