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PUBLICATIONS

Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts

Published

Author(s)

Vivek M. Prabhu, Ronald L. Jones, Eric K. Lin, Christopher L. Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
Proceedings Title
Proceedings of SPIE
Volume
5039
Conference Dates
February 24-26, 2003
Conference Location
Santa Clara, CA
Conference Title
SPIE Advanced Lithography
Pub Type
Conferences

Download Paper

Local Download

Keywords

Copolymers, Electronic Materials, Lithography, Scattering, Solutions, additives, developer, neutron scattering, photoresist, polyelectrolyte, roughness, solvent quality
Polymers

Citation

Prabhu, V. , Jones, R. , Lin, E. , Soles, C. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2003), Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts, Proceedings of SPIE, Santa Clara, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853867 (Accessed October 10, 2025)

Issues

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Created January 1, 2003, Updated February 19, 2017
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