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Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts

Published

Author(s)

Vivek M. Prabhu, Ronald L. Jones, Eric K. Lin, Christopher L. Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
Proceedings Title
Proceedings of SPIE
Volume
5039
Conference Dates
February 24-26, 2003
Conference Location
Santa Clara, CA
Conference Title
SPIE Advanced Lithography

Keywords

Copolymers, Electronic Materials, Lithography, Scattering, Solutions, additives, developer, neutron scattering, photoresist, polyelectrolyte, roughness, solvent quality

Citation

Prabhu, V. , Jones, R. , Lin, E. , Soles, C. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2003), Polyelectrolyte Effects in Model Photoresist Developer Solutions: Roles of Base Concentration and Added Salts, Proceedings of SPIE, Santa Clara, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853867 (Accessed April 20, 2024)
Created January 1, 2003, Updated February 19, 2017