Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers

Published

September 1, 2001

Author(s)

S Y. Yang, P A. Mirau, C S. Pai, O Nalamasu, E Reichmanis, Eric K. Lin, V. J. Lee, D W. Gidley, J N. Sun

Abstract

Triblock polymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PPO-b-PEO), are used as molecular templates in poly(methyl silsesquioxane) (MSQ) matrices to fabricate nanoporous organosilicates. Initially homogeneous blends of the triblock copolymer and the MSQ precursor microphase separate during a curing step when the MSQ becomes increasingly hydrophobic. The polymer domain size in the MSQ composites, (3-10) nm, depends on the polymer architecture and loading percentage. Extremely small pores, (2-5) nm are generated after heating the film to remove the template material. These materials can attain ultra low-dielectric constants (k= 1.5) with superior electrical and mechanical properties.

Citation

Chemistry of Materials

Volume

13

Issue

No. 9

Pub Type

Journals

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Keywords

low-k dielectric, nanoporous thin film, nuclear magnetic resonance, positronium annihiliation lifetime spect, small angle neutron scattering, triblock copolymers

Citation

Yang, S. , Mirau, P. , Pai, C. , Nalamasu, O. , Reichmanis, E. , Lin, E. , Lee, V. , Gidley, D. and Sun, J. (2001), Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851868 (Accessed October 9, 2025)