Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers

Published

Author(s)

S Y. Yang, P A. Mirau, C S. Pai, O Nalamasu, E Reichmanis, Eric K. Lin, V. J. Lee, D W. Gidley, J N. Sun

Abstract

Triblock polymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PPO-b-PEO), are used as molecular templates in poly(methyl silsesquioxane) (MSQ) matrices to fabricate nanoporous organosilicates. Initially homogeneous blends of the triblock copolymer and the MSQ precursor microphase separate during a curing step when the MSQ becomes increasingly hydrophobic. The polymer domain size in the MSQ composites, (3-10) nm, depends on the polymer architecture and loading percentage. Extremely small pores, (2-5) nm are generated after heating the film to remove the template material. These materials can attain ultra low-dielectric constants (k= 1.5) with superior electrical and mechanical properties.
Citation
Chemistry of Materials
Volume
13
Issue
No. 9

Keywords

low-k dielectric, nanoporous thin film, nuclear magnetic resonance, positronium annihiliation lifetime spect, small angle neutron scattering, triblock copolymers

Citation

Yang, S. , Mirau, P. , Pai, C. , Nalamasu, O. , Reichmanis, E. , Lin, E. , Lee, V. , Gidley, D. and Sun, J. (2001), Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851868 (Accessed December 14, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created August 31, 2001, Updated October 12, 2021