Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers
S Y. Yang, P A. Mirau, C S. Pai, O Nalamasu, E Reichmanis, Eric K. Lin, V. J. Lee, D W. Gidley, J N. Sun
Triblock polymers, poly(ethylene oxide-b-propylene oxide-b-ethylene oxide) (PEO-b-PPO-b-PEO), are used as molecular templates in poly(methyl silsesquioxane) (MSQ) matrices to fabricate nanoporous organosilicates. Initially homogeneous blends of the triblock copolymer and the MSQ precursor microphase separate during a curing step when the MSQ becomes increasingly hydrophobic. The polymer domain size in the MSQ composites, (3-10) nm, depends on the polymer architecture and loading percentage. Extremely small pores, (2-5) nm are generated after heating the film to remove the template material. These materials can attain ultra low-dielectric constants (k= 1.5) with superior electrical and mechanical properties.
low-k dielectric, nanoporous thin film, nuclear magnetic resonance, positronium annihiliation lifetime spect, small angle neutron scattering, triblock copolymers
, Mirau, P.
, Pai, C.
, Nalamasu, O.
, Reichmanis, E.
, Lin, E.
, Lee, V.
, Gidley, D.
and Sun, J.
Molecular Templating of Nanoporous Ultralow Dielectric Constant (approximate to 1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers, Chemistry of Materials, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851868
(Accessed December 3, 2023)