Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Characterization of Thin and Ultrathin Polymer and Resist Films

Published

Author(s)

D L. Goldfarb, Q Lin, M Angelopoulos, Christopher Soles, Eric K. Lin, Wen-Li Wu

Abstract

The need for a better understanding of the physicochemical properties of radiation-sensitive thin polymer coatings for lithographic applications is driven by the trend of ever-shrinking pattern dimensions and film thickness, imposed by the semiconductor industry. In this work, we address the issue of film uniformity and moisture absorption for thin and ultrathin films (250-50 nm) of poly 4-hydroxystyrene (PHS). Using high resolution x-ray reflectivity, the roughness and density of spin coated films was found to remain constant within experimental error for the thickness range examined. Also, water uptake on PHS films was studied by neutron and x-ray reflectivity. Exposure of the polymer film to a controlled humidity level is shown to swell the polymer and be absorbed uniformly throughout the film. No preferential absorption of water at the interface was noticed, regardless of the hydrophilic or hydrophobic nature of the substrate surface. Overall density changes in the polymer matrix due to the moisture-induced increase in the film thickness are also discussed.
Proceedings Title
Advances in Resist Technology and Processing, Conference | 18th | Advances in Resist Technology and Processing XVIII | SPIE
Volume
4345
Issue
Pt. 1
Conference Dates
February 1, 2001
Conference Location
Undefined
Conference Title
Proceedings of SPIE--the International Society for Optical Engineering

Keywords

chemically amplified resists, density, moisture absorption, neutron reflectivity, poly-4-hydroxystyrene, roughness, ultrathin films, x-ray reflectivity

Citation

Goldfarb, D. , Lin, Q. , Angelopoulos, M. , Soles, C. , Lin, E. and Wu, W. (2001), Characterization of Thin and Ultrathin Polymer and Resist Films, Advances in Resist Technology and Processing, Conference | 18th | Advances in Resist Technology and Processing XVIII | SPIE, Undefined, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851906 (Accessed April 16, 2024)
Created July 31, 2001, Updated October 12, 2021