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Combinatorial Methodologies Offer Potential for Rapid Research of Photo-resist Materials and Formulations

Published

Author(s)

Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
Citation
Journal of Vacuum Science and Technology B
Volume
20(2)

Keywords

Blends, Combinatorial and THE Methods, Electronic Materials, Kinetics, Lithography, Spectroscopy, Thermal Properties, Thin Films, combinatorial, deprotection, line edge roughness, photolithography, photoresist, polymer

Citation

Lenhart, J. , Jones, R. , Lin, E. , Soles, C. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2002), Combinatorial Methodologies Offer Potential for Rapid Research of Photo-resist Materials and Formulations, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853816 (Accessed May 30, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2001, Updated October 12, 2021