U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Combinatorial Methodologies Offer Potential for Rapid Research of Photo-resist Materials and Formulations

Published

Author(s)

Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, Ronald L. Jones, Eric K. Lin, Christopher Soles, Wen-Li Wu, D L. Goldfarb, M Angelopoulos
Citation
Journal of Vacuum Science and Technology B
Volume
20(2)
Pub Type
Journals

Download Paper

Local Download

Keywords

Blends, Combinatorial and THE Methods, Electronic Materials, Kinetics, Lithography, Spectroscopy, Thermal Properties, Thin Films, combinatorial, deprotection, line edge roughness, photolithography, photoresist, polymer

Citation

Lenhart, J. , Jones, R. , Lin, E. , Soles, C. , Wu, W. , Goldfarb, D. and Angelopoulos, M. (2002), Combinatorial Methodologies Offer Potential for Rapid Research of Photo-resist Materials and Formulations, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853816 (Accessed October 5, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2001, Updated October 12, 2021