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Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films Using Different Methods of Nondestructive Instrumentation

Published

Author(s)

E Kondoh, M R. Baklanov, Eric K. Lin, D Gidley, A Nakashima

Abstract

Pore sizes of hydrogen-methyl-siloxane-based porous spin-on-glass (SOG) thin films are comparatively studied with different non-destructive instrumental methods and also with reference to sorption porosimetry. The pore size and its spread are found to increase with increasing porosity, or with decreasing dielectric constant.
Citation
Japanese Journal of Applied Physics Part 2: Letters
Volume
40
Issue
No. 4A

Keywords

ellipsometry, low-dielectric-constant thin films, neutron scattering, pore size distribution, positron annihilation

Citation

Kondoh, E. , Baklanov, M. , Lin, E. , Gidley, D. and Nakashima, A. (2001), Comparative Study of Pore Size of Low-Dielectric-Constant Porous Spin-On-Glass Films Using Different Methods of Nondestructive Instrumentation, Japanese Journal of Applied Physics Part 2: Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851851 (Accessed July 21, 2024)

Issues

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Created March 31, 2001, Updated October 12, 2021