Skip to main content

NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Shear Induced Polymer Melt Desorption From an Attractive Substrate

Published

Author(s)

Eric K. Lin, R Kolb, Wen-Li Wu, Sushil K. Satija

Abstract

Shear induced adsorption/desorption of a highly entangled polymer melt from an attractive interface was directly observed using neutron reflectometry. The concentration of poly(methyl methacrylate) (d-PMMA) in a hydrogenated PMMA matrix was measured within 20 {Angstroms} of the surface of silicon wafers after an applied shear deformation. Substantial decreases in the surface concentration of d-PMMA relative to that in the static case were observed with increasing shear rates.
Citation
Physical Review Letters

Keywords

neutron reflectivity, polymer desorption, polymer dynamics, polymer-solid interface

Citation

Lin, E. , Kolb, R. , Wu, W. and Satija, S. (1999), Shear Induced Polymer Melt Desorption From an Attractive Substrate, Physical Review Letters, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851465 (Accessed October 11, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created June 24, 1999, Updated February 17, 2017
Was this page helpful?