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Neutron Reflectivity Measurements for the Interfacial Characterization of Polymer Thin Film Photoresists

Published

Author(s)

Eric K. Lin, Christopher L. Soles, Wen-Li Wu, Sushil K. Satija, Q Lin, M Angelopoulos
Conference Location
Brookfield, CT
Conference Title
Proceedings of the 12th International Conference on Photopolymers

Keywords

Diffusion, Electronic Materials, Lithography, Reflectivity, Thin Films, interfacial broadenting, neutron reflectivity, photolithography, polymer interdiffusion

Citation

Lin, E. , Soles, C. , Wu, W. , Satija, S. , Lin, Q. and Angelopoulos, M. (2001), Neutron Reflectivity Measurements for the Interfacial Characterization of Polymer Thin Film Photoresists, Proceedings of the 12th International Conference on Photopolymers, Brookfield, CT, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853773 (Accessed October 8, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2001, Updated February 17, 2017