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Comparative Study of Porous SOG Films with Different Non-Destructive Instrumentation

Published

Author(s)

M R. Baklanov, E Kondoh, Eric K. Lin, D W. Gidley, V. J. Lee, K P. Mogilnikov, J N. Sun
Conference Location
Undefined
Conference Title
Proc. of the Intl. Interconnect Technology Conf

Keywords

Electronic Materials, Nanostructured Materials, Reflectivity, Scattering, Thin Films, ellipsometric porosimetry, pore size, poresize distribution, porosity, porous low-k dielectric, positron annihilation lifetime spectrosc, small angle neutron scattering, x-ray reflectivity

Citation

Baklanov, M. , Kondoh, E. , Lin, E. , Gidley, D. , Lee, V. , Mogilnikov, K. and Sun, J. (2001), Comparative Study of Porous SOG Films with Different Non-Destructive Instrumentation, Proc. of the Intl. Interconnect Technology Conf, Undefined, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853742 (Accessed June 18, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2000, Updated October 12, 2021