NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.
Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.
An official website of the United States government
Here’s how you know
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Properties of Nanoporous Silica Thin Films Determined by High-Resolution X-Ray Reflectivity and Small-Angle Neutron Scattering
Published
Author(s)
Wen-Li Wu, William E. Wallace, Eric K. Lin, G W. Lynn, Charles J. Glinka, E T. Ryan, H M. Ho
Abstract
A new methodology based on a novel combination of a high-resolution specular x-ray reflectivity and small-angle neutron scattering has been developed to evaluate the structural properties of low-dielectric-constant porous silica thin films about one micrometer thick supported on silicon wafer substrates. To complement these results film composition was determined by high-energy ion scattering techniques. For the example thin film presented here, the overall film density was found to be (0.55 0.01) g/cm3 with a pore wall density of (1.16 0.05) g/cm3 and a porosity of (53 1)%. The characteristic average dimension for the pores was found to be (65 1) . It was determined that (22.1 0.5)% of the pures had connective paths to the free surface. The mass fraction of water absorption was (3.0 0.5)% and the coefficient of thermal expansion was (60 20)X10-6/ C from room temperature to 175 C. Lastly, model fitting of the specular x-ray reflectivity data indicated the presence of a thin surface layer with an increased electron density compared to the bulk of the film as well as an interfacial layer with a reduced electron density.
coefficient of thermal expansion, density, moisture uptake, pore size, porosity, silica, small angle neutron scattering
Citation
Wu, W.
, Wallace, W.
, Lin, E.
, Lynn, G.
, Glinka, C.
, Ryan, E.
and Ho, H.
(2000),
Properties of Nanoporous Silica Thin Films Determined by High-Resolution X-Ray Reflectivity and Small-Angle Neutron Scattering, Journal of Applied Physics, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851582
(Accessed October 9, 2025)