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Structure and Property Characterization of Low-k Dielectric Porous Thin Films Determined by X-ray Reflectivity and Small-Angle Neutron Scattering

Published

Author(s)

Eric K. Lin, V. J. Lee, Barry J. Bauer, Haonan Wang, J T. Wetzel, Wen-Li Wu
Volume
47(6)
Conference Location
Gaithersburg, MD
Conference Title
Characterization and Metrology for ULSI Technology : 2000 International Conference

Keywords

SANS, electronic materials, low-k dielectric material, microstructure, porous thin film, reflectivity, scattering, small angle neutron scattering, thin films, x-ray reflectivity

Citation

Lin, E. , Lee, V. , Bauer, B. , Wang, H. , Wetzel, J. and Wu, W. (2000), Structure and Property Characterization of Low-k Dielectric Porous Thin Films Determined by X-ray Reflectivity and Small-Angle Neutron Scattering, Characterization and Metrology for ULSI Technology : 2000 International Conference, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853662 (Accessed June 25, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2000, Updated February 17, 2017