Lin, E.
, Lee, V.
, Bauer, B.
, Wang, H.
, Wetzel, J.
and Wu, W.
(2000),
Structure and Property Characterization of Low-k Dielectric Porous Thin Films Determined by X-ray Reflectivity and Small-Angle Neutron Scattering, Characterization and Metrology for ULSI Technology : 2000 International Conference, Gaithersburg, MD, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=853662
(Accessed October 8, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Structure and Property Characterization of Low-k Dielectric Porous Thin Films Determined by X-ray Reflectivity and Small-Angle Neutron Scattering
Published
Author(s)
, V. J. Lee, , , J T. Wetzel,
Volume
47(6)
Conference Location
Gaithersburg, MD
Conference Title
Characterization and Metrology for ULSI Technology : 2000 International Conference
Pub Type
Conferences
Download Paper
Keywords
SANS, electronic materials, low-k dielectric material, microstructure, porous thin film, reflectivity, scattering, small angle neutron scattering, thin films, x-ray reflectivity
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created January 1, 2000, Updated February 17, 2017