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A Three-Phase Model for the Structure of Porous Thin Films Determined by X-Ray Reflectivity and Small Angle Neutron Scattering

Published

Author(s)

Wen-Li Wu, Eric K. Lin, C Jin, J T. Wetzel

Abstract

A methodology to characterize nanoporous thin films based on a novel combination of high resolution specular x-ray reflectivity and small angle neutron scattering has been advanced to accommodate heterogeneities within the material surrounding nanoscale voids. More specifically, the average pore size, pore connectivity, film thickness, wall or matrix density, coefficient of thermal expansion, and moisture uptake of nanoporous thin films with non-homogeneous solid matrices can be measured. The measurements can be performed directly on films up to 1.5 m thick while supported on silicon substrates. This method has been successfully applied to a wide range of industrially developed materials for use as low-k interlayer dielectrics.
Proceedings Title
Materials, Technology, and Reliability for Advanced Interconnects and Low-K Dielectrics, Symposium | | Materials, Technology, and Reliability for Advanced Interconnects and Low-K Dielectrics | Materials Research Society
Volume
612
Conference Dates
April 1, 2000
Conference Location
San Francisco, CA
Conference Title
Materials Research Society Symposium Proceedings

Keywords

interlayer dielectrics, low dielectric films, moisture uptake, nanoporous, porosity, small angle neutron scattering, x-ray reflectivity

Citation

Wu, W. , Lin, E. , Jin, C. and Wetzel, J. (2000), A Three-Phase Model for the Structure of Porous Thin Films Determined by X-Ray Reflectivity and Small Angle Neutron Scattering, Materials, Technology, and Reliability for Advanced Interconnects and Low-K Dielectrics, Symposium | | Materials, Technology, and Reliability for Advanced Interconnects and Low-K Dielectrics | Materials Research Society, San Francisco, CA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=851720 (Accessed July 20, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created April 1, 2000, Updated February 17, 2017