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Search Publications by: Andras E. Vladar (Fed)

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Displaying 151 - 175 of 190

Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library

March 1, 2001
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek
In semiconductor electronics manufacturing, device performance often depends upon size. For example, microprocessor speed is linked to the width of transistor gates. Accurate measurement of feature width is an important but challenging problem. When a

NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs

January 1, 2001
Author(s)
Andras Vladar, Michael T. Postek
This is the final report of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscope (SEMs) used in integrated circuit production. Nano-tips are essentially very sharp electron emitter tips that offer an

SEM Sentinel - SEM Performance Measurement System

January 1, 2001
Author(s)
Bradley N. Damazo, Andras Vladar, Alice V. Ling, M A. Donmez, Michael T. Postek, Crossley E. Jayewardene
This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and

NIST/SEMATECH Collaboration: Application of Nano-Tips to Production CD-SEMs

November 15, 2000
Author(s)
Andras Vladar, Michael T. Postek
This work documents the first part of a two-part study about the application of nano-tips to critical dimension (CD) scanning electron microscopes used in integrated circuit production. Nano-tips, by comparison to all conventional cold, thermally assisted

Is a Production Level Scanning Electron Microscope Linewidth Standard Possible?

June 1, 2000
Author(s)
Michael T. Postek, Andras Vladar, John S. Villarrubia
Metrology will remain a pricipal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 nm and 100 nm linewidths and high aspect ratio structures, the scanning electron microscope (SEM) remains

Is a Production-Level Scanning Electron Microscope Linewidth Standard Possible?

June 1, 2000
Author(s)
Michael T. Postek, Andras Vladar, John S. Villarrubia
Metrology will remain a principal enabler for the development and manufacture of future generations of semiconductor devices. With the potential of 130 and l00-nanometer linewidths and high aspect ratio structures, the scanning electron microscope (SEM)

Linewidth Measurement Intercomparison on a BESOI Sample

June 1, 2000
Author(s)
John S. Villarrubia, Andras Vladar, J R. Lowney, Michael T. Postek, Richard A. Allen, Michael W. Cresswell, Rathindra Ghoshtagore
The effect of the instrument on the measurement must be known in order to generate an accurate linewidth measurement. Although instrument models exist for a variety of techniques, how does one assess the accuracy of these models? Intercomparisons between

SEM Sentinel - SEM Performance Measurement System, Part 1

April 1, 2000
Author(s)
Alice V. Ling, Andras Vladar, Bradley N. Damazo, M A. Donmez, Michael T. Postek
This report describes the current design of a system for monitoring the performance of several major subsystems of a scanning electron microscope (SEM). The following subsystems and the associated functional parameters will be monitored. 1) Vacuum system

Unified Advanced CD-SEM specification for Sub-0.18um Technology (1999 Version)

January 31, 2000
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, A Delaporte, Michael T. Postek, J Schlesinger, B Singh, Andras Vladar, A Yanof
The Advanced Metrology Advisory Group (AMAG) comprised of representatives from: the International SEMATECH (ISEMATECH) consortium member companies; the National Institute of Standards and Technology; and ISEMATECH assignees have joined to develop a unified

Image Sharpness Measurement in Scanning Electron Microscope - Part III

July 1, 1999
Author(s)
Samuel N. Jones, Robert D. Larrabee, Michael T. Postek, Andras Vladar, Nien F. Zhang
Fully automated or semi-automated scanning electron microscopes (SEM) are now commonly used in semiconductor production and other forms of manufacturing. Testing and proving that the instrument is performing at a satisfactory level of sharpness is an

Toward a Unified Advanced CD-SEM Specification for Sub 0.18 Micrometer Technology

June 1, 1998
Author(s)
J Allgair, C Archie, W Banke, H Bogardus, J Griffith, H Marchman, Michael T. Postek, L Saraf, J Schlesinger, B Singh, N. Sullivan, L Trimble, Andras Vladar, A Yanof
The stringent critical dimension (CD) control requirements in cutting edge device facilities have placed significant demands on metrologists and upon the tools they use. We are developing a unified, advanced critical dimension scanning electron microscope

Image Sharpness Measurement in Scanning Electron Microscopy - Part I

January 1, 1998
Author(s)
Michael T. Postek, Andras Vladar
This study introduces the idea of the sharpness concept in relationship to the determination of scanning electron microscope (SEM) perfomance. Scanning electron microscopes are routinely used in many manufacturing environments. Fully automated or

Inexpensive Digital Imaging?

June 1, 1997
Author(s)
Michael T. Postek, Andras Vladar
The capture of digital images through the use of a frame grabber provides tremendous advantages to scanning electron microscopy. Accessory frame grabbers can range in price from very inexpensive to several thousand dollars. This work investigates the
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