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Search Publications by: Andras E. Vladar (Fed)

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Displaying 151 - 175 of 374

Understanding Imaging and Metrology with the Helium Ion Microscope

March 1, 2009
Author(s)
Michael T. Postek, Andras Vladar, Bin Ming
The development of accurate metrology for the characterization of nanomaterials is one barrier to innovation confronting all phases of nanotechnology. Ultra-high resolution microscopy is a key technology needed to achieve this goal. But, current microscope

Design of an on-chip microscale nanoassembly system

February 10, 2009
Author(s)
Jason J. Gorman, Yong Sik Kim, Andras Vladar, Nicholas G. Dagalakis
A microscale nanoassembly system has been designed for the fabrication of nanodevices and in situ electromechanical characterisation of nanostructures. This system consists of four Microelectromechanical Systems(MEMS)-based nanomanipulators positioned

International photomask linewidth comparison by NIST and PTB

October 17, 2008
Author(s)
James E. Potzick, Ronald G. Dixson, Richard Quintanilha, Michael T. Stocker, Andras Vladar, Egbert Buhr, Bernd Bodermann, Wolfgang Hassler-Grohne, Harald Bosse, C.G. Frase
In preparation of the international Nano1 linewidth comparison on photomasks between 8 national metrology institutes, NIST and PTB have started a bilateral linewidth comparison in 2008, independent of and prior to the Nano1 comparison in order to test the

Cellulose Nanocrystals the Next Big Nano-thing?

August 6, 2008
Author(s)
Michael T. Postek, Andras Vladar, John A. Dagata, Natalia Farkas, Bin Ming, Ronald Sabo, Theodore H. Wegner
Biomass surrounds us from the smallest alga to the largest redwood tree. Even the largest trees owe their strength to a newly-appreciated class of nanomaterials known as cellulose nanocrystals (CNC). Cellulose, the world s most abundant natural, renewable

Simulated SEM Images for Resolution Measurement

July 30, 2008
Author(s)
Petr Cizmar, Andras Vladar, Bin Ming, Michael T. Postek
Resolution is a key performance metric, which often defines the quality of a scanning electron microscope (SEM). Traditionally, there is the subjective measurement of the distance between two points on special ''resolution'' samples and there are several

The Potentials of Helium Ion Microscopy for Semiconductor Process Metrology

February 6, 2008
Author(s)
Michael T. Postek, Andras Vladar
Semiconductor manufacturing is always looking for more effective ways to monitor and control the manufacturing process. Helium Ion Microscopy (HIM) presents a new approach to process monitoring which has several potential advantages over the traditional

Instrumentation, Metrology, and Standards for Nanomanufacturing

September 10, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

The Helium Ion Microscope: A New Tool for Nanotechnology and Nanomanufacturing

September 1, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
Helium Ion Microscopy (HIM) is a new, potentially disruptive technology for nanotechnology and nanomanufacturing. This methodology presents a potentially revolutionary approach to imaging and measurements which has several potential advantages over the

Helium Ion Microscopy: A New Technique for Semiconductor Metrology and Nanotechnology

January 1, 2007
Author(s)
Michael T. Postek, Andras Vladar, John A. Kramar, L A. Stern, John Notte, Sean McVey
The Helium Ion Microscope (HIM) offers a new, potentially disruptive technique for nano-metrology. This methodology presents an approach to measurements for nanotechnology and nano-manufacturing which has several potential advantages over the traditional
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